NASDAQ
4.58USD
+0.01 (+0.22%)
We have scored 6 news catalysts on CVD Equipment Corporation (CVV) over the past 12 months. The biggest single-day move next to one of them came Nov 25, 2025, when CVV closed +3.8%: “CanAlaska Announces Results from Geophysical Program on West McArthur Project”. Coverage across the window leans positive (average ticker sentiment +0.33). Most of the impact sits in price momentum and short squeeze potential.
Dots are scored news catalysts — size = impact, color = sentiment. Tap one to read it.
Market cap
32.3M
P/E
—
EPS
—
Beta
1.24
52W range
2.96-9.1
Day range
4.53–4.65
Open
4.59
Prev close
4.57
Volume
69.2K
Avg volume
130.7K
Dividend
0.00
IPO
1999-03-01
Daily OHLCV with SMA overlays and session pivots. Draw your levels and trendlines on it, or ask the AI analyst what the price is reacting to.
Suppliers, customers, partners and competitors, derived from what the news actually says about CVD Equipment Corporation — not a sector bucket. Click an edge to see the articles that established the link.
Latest scored catalyst for CVV: .
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CVD Equipment Corporation, along with its affiliated entities, specializes in the engineering, manufacturing, and distribution of sophisticated process equipment and comprehensive solutions. These offerings are instrumental in the creation and fabrication of advanced materials and specialized coatings, catering to both research institutions and industrial sectors, predominantly within the United States. The company operates through three distinct divisions: CVD, SDC, and CVD Materials. Its extensive product portfolio features: Chemical Vapor Deposition (CVD) Systems: These are vital for the research, development, and production across diverse fields such as aerospace, medical components, semiconductors, LED technology, carbon nanotubes, nanowires, solar cells, and various other industrial applications. Rapid Thermal Processing Systems: Utilized for critical processes including implant activation, oxidation, and silicide formation. Furnaces: Encompassing annealing, diffusion, and low-pressure chemical vapor deposition models, employed in diffusion, oxidation, implant annealing, solder reflow, and solar cell manufacturing. Gas and Liquid Control Systems: This category includes gas cylinder storage cabinets, bespoke gas and chemical delivery setups, valve manifold boxes for gas and liquids, and gas isolation boxes, all crucial for semiconductor fabrication, solar cell production, LEDs, carbon nanotubes, nanowires, and general industrial use. Quartz-ware: Both standard and custom-fabricated items, often integrated into the company's own equipment or supplied for other customer tools, complemented by repair and replacement services. MesoPlasma Direct Write Printing: An innovative material deposition technique enabling the creation of instrumentation, intricate patterns, and coatings on complex, conformal surfaces. Tantaline Corrosion-Resistant Coatings: Applied to enhance the durability of components like valves, fittings, fasteners, vessels, bellows, and other custom-designed items. Additional Materials: The company also provides carbon composites and various electronic materials. CVD Equipment Corporation's clientele primarily consists of organizations in the aerospace and defense sectors, the medical industry, electronic component manufacturers, academic institutions, as well as government and private industrial laboratories. Established in 1982, the company maintains its headquarters in Central Islip, New York.
